Thermal Evaporation System
1. System can be operated in Manual, Semi-auto, or Fully-auto mode
2. The system is capable of uniform deposition of ≦±5% (center-to-edge)
3. It has excellent thin film uniformity and target utilizing efficiency
4. Chamber cleaning is convenient and fast.

Boat quantity	1~4
Thickness Uniformity	±5%
Ultimate Pressure	≦ 9E-7 Torr
Heating Mechanism	RT~ 300℃
Control System	PLC / PLC+PC
Optional	1. Ion Source 2. Substrate Bias 3. Plasma cleaning 4. Substrate Heating

 

 

 

 

 

 

 

 

 

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