1. The e-beam system is specifically designed for deposition of a wide variety of materials including metals, dielectrics, oxides, semiconductors and alloys for R&D laboratory and pilot production applications
2. The system is capable of uniform deposition of ≦±5% (center-to-edge)
3. The system can be configured with an ion source for ion-beam cleaning.
4. System is available with different vacuum pumps including mechanical, dry-pump, turbo-pump, and cryo-pump for high-vacuum and ultra-high vacuum applications
5. Additional features include versatility, ease of operation, and long term reliability for evaporation of single and multiple layers of thin or thick films